US Patent Issued to Taiwan Semiconductor Manufacturing on Feb. 3 for "System and method for removing volatile organic compounds from process gasses" (Taiwanese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,539,490, issued on Feb. 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for removing volatile organic compounds from process gasses" was invented by Yen-Cheng Lai (Hsinchu, Taiwan), Po-Yuan Chang (Hsinchu, Taiwan), Ting Hsin Chang (Hsinchu, Taiwan), Neng Chuan Chen (Hsinchu, Taiwan) and Hsiang I. Feng (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A VOC removal system removes VOCs from an exhaust fluid of a semiconductor process. The VOC removal system measures current VOC removal parameters and passes them to an analysis model trained with a machine learning process. The analysis mode...