ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,542,264, issued on Feb. 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Sputter target magnet" was invented by Ming-Jie He (Hsin-Chu, Taiwan), Shawn Yang (Hsin-Chu, Taiwan), Szu-Hsien Lo (Hsin-Chu, Taiwan), Shuen-Liang Tseng (Hsinchu, Taiwan), Wen-Cheng Cheng (Hsinchu, Taiwan), Chen-Fang Chung (Zhubei, Taiwan), Chia-Lin Hsueh (Zhubei, Taiwan) and Kuo-Pin Chuang (Xinfeng Township, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for modifying magnetic field distribution in a deposition chamber is disclosed. The method includes the operations of providing a target magnetic field distribution, removing a firs...