ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,560, issued on Feb. 3, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor structure" was invented by Chia-Ta Yu (New Taipei, Taiwan), Kai-Hsuan Lee (Hsinchu, Taiwan), Sai-Hooi Yeong (Zhubei, Taiwan), Yen-Chieh Huang (Tainan, Taiwan) and Feng-Cheng Yang (Zhudong Township, Hsinchu County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a fin structure formed over a substrate. The structure also includes a gate structure formed across the fin structure. The structure also includes source/drain epitaxial structures formed on opposite sides of the gate structure. The s...