ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,230,517, issued on Feb. 18, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Exhaust system and process equipment" was invented by Hsien-Chang Hsieh (Hsinchu, Taiwan), Chun-Chih Lin (Hsinchu, Taiwan), Tah-te Shih (Hsinchu, Taiwan), Wen-Hsong Wu (Hsinchu, Taiwan), Chune-Te Yang (Hsinchu, Taiwan) and Yu-Jen Su (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An exhaust structure includes a piping section, wherein the piping section has a first inner diameter in a central region of the piping section, the piping section has a second diameter in at least one of an inlet or an outlet, and the second diameter ...