US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Feb. 17 for "System and method of monitoring precursor tank" (Taiwanese Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,823, issued on Feb. 17, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"System and method of monitoring precursor tank" was invented by Chia-Hsi Wang (Changhua County, Taiwan), Yen-Yu Chen (Taichung, Taiwan), Jui-Mu Cho (Hsinchu County, Taiwan) and Chung Hsien Liao (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for monitoring a precursor tank during a deposition process includes a sensor and a signal processor. The sensor includes a sensor chamber connected in line with the precursor tank and a deposition chamber, a radiation emitter to emit a radiation passing through a precursor-contain...