US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Dec. 9 for "EUV pellicle and mounting method thereof on photo mask" (Taiwanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,237, issued on Dec. 9, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"EUV pellicle and mounting method thereof on photo mask" was invented by Wen-Yao Wei (Hsinchu, Taiwan), Chi-Lun Lu (Hsinchu, Taiwan) and Hsin-Chang Lee (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of de-mounting a pellicle from a photo mask, the photo mask with the pellicle is placed on a pellicle holder. The pellicle is attached to the photo mask by a plurality of micro structures. The plurality of micro structures are detached from the photo mask by applying a force or energy to the plurality of micro struc...