ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,514,009, issued on Dec. 30, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Isolation structure configured to reduce cross talk in image sensor" was invented by Cheng-Ying Ho (Minxiong Township, Taiwan), Wen-De Wang (Minsyong Township, Taiwan), Keng-Yu Chou (Kaohsiung, Taiwan), Kai-Chun Hsu (Yonghe, Taiwan), Tzu-Hsuan Hsu (Kaohsiung, Taiwan) and Jen-Cheng Liu (Hsin-Chu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Various embodiments of the present disclosure are directed towards an image sensor having a photodetector disposed within a semiconductor substrate. A dielectric structure is disposed on a first side of...