ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,506,007, issued on Dec. 23, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Method of manufacturing semiconductor devices and semiconductor devices" was invented by Hao-Ming Tang (Taipei, Taiwan), Shu-Han Chen (Hsinchu, Taiwan), Yun-San Chien (Hsinchu, Taiwan), Da-Yuan Lee (Jhubei, Taiwan), Chi On Chui (Hsinchu, Taiwan), Tsung-Ju Chen (Hsinchu, Taiwan), Yi-Hsin Ting (Pingtung County, Taiwan) and Han-Shen Wang (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of manufacturing a semiconductor device, a fin structure is formed by patterning a semiconductor layer, an isolation insulating layer is...