US Patent Issued to Taiwan Semiconductor Manufacturing on Dec. 2 for "Semiconductor device cleaning solution, method of use, and method of manufacture" (Taiwanese Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,479, issued on Dec. 2, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor device cleaning solution, method of use, and method of manufacture" was invented by Pinlei Edmund Chu (Hsinchu, Taiwan), Chun-Wei Hsu (Hsinchu, Taiwan), Ling-Fu Nieh (Taipei, Taiwan), Chi-Jen Liu (Taipei, Taiwan), Liang-Guang Chen (Hsinchu, Taiwan) and Yi-Sheng Lin (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor cleaning solution for cleaning a surface of a semiconductor device, and a method of use and a method of manufacture of the cleaning solution are disclosed. In an embodiment, a material is polish...