ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,659, issued on Aug. 5, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Photoresist composition and method of manufacturing a semiconductor device" was invented by Tzu-Yang Lin (Tainan, Taiwan), Ching-Yu Chang (Yuansun Village, Taiwan) and Chin-Hsiang Lin (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A photoresist composition includes a photoactive compound and a polymer. The polymer has a polymer backbone including one or more groups selected from:The polymer backbone includes at least one group selected from B, C-1, or C-2, wherein ALG is an acid labile group, and X is a linking group."
The pate...