US Patent Issued to Taiwan Semiconductor Manufacturing on Aug. 5 for "Gas tube, gas supply system and manufacturing method of semiconductor device using the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,378,668, issued on Aug. 5, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Gas tube, gas supply system and manufacturing method of semiconductor device using the same" was invented by Yi-Shiung Chen (Taoyuan, Taiwan), Cheng-Yi Huang (Hsinchu, Taiwan), Chih-Shen Yang (Yunlin County, Taiwan), Shou-Wen Kuo (Hsinchu, Taiwan) and Po-Wen Chai (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas tube, a gas supply system containing the same and a semiconductor manufacturing method using the same are provided. The gas tube includes a porous material body and a resistant sheath surrounding the porous material body. ...