US Patent Issued to Taiwan Semiconductor Manufacturing on Aug. 5 for "Extreme ultraviolet lithography system" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,675, issued on Aug. 5, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Extreme ultraviolet lithography system" was invented by Ssu-Yu Chen (New Taipei, Taiwan), Po-Chung Cheng (Chiayi County, Taiwan), Li-Jui Chen (Hsinchu, Taiwan), Che-Chang Hsu (Taichung, Taiwan) and Chi Yang (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme ultraviolet (EUV) lithography system includes a vane bucket module. The vane bucket module includes a temperature adjusting pack and a collecting tank inserted into the temperature adjusting pack. The temperature adjusting pack has a plurality of inlets. The collecting ta...