ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,867, issued on Aug. 26, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).
"Integrated circuit device" was invented by Meng-Han Lin (Hsinchu, Taiwan), Chih-Ren Hsieh (Changhua County, Taiwan), Chih-Pin Huang (Hsinchu, Taiwan) and Ching-Wen Chan (Taichung, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit device includes a substrate, an isolation feature, a memory cell, and a semiconductor device. The substrate has a cell region, a peripheral region, and a transition region between the cell region and the peripheral region. The isolation feature is in the transition region. A top surface of the is...