ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,389,665, issued on Aug. 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor device structure" was invented by Lin-Yu Huang (Hsinchu, Taiwan), Sheng-Tsung Wang (Hsinchu, Taiwan), Jia-Chuan You (Taoyuan, Taiwan), Chia-Hao Chang (Hsinchu, Taiwan), Tien-Lu Lin (Hsinchu, Taiwan), Yu-Ming Lin (Hsinchu, Taiwan) and Chih-Hao Wang (Baoshan Township, Hsinchu County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor device structures and method for forming the same are provided. The semiconductor device structure includes a substrate and a gate stack formed over the substrate. The semiconductor de...