ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,389,518, issued on Aug. 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of manufacturing integrated circuit" was invented by Chansyun David Yang (Hsinchu, Taiwan), Keh-Jeng Chang (Hsinchu, Taiwan) and Chan-Lon Yang (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for generating an extreme ultraviolet (EUV) radiation includes simultaneously irradiating two or more target droplets with laser light in an EUV radiation source apparatus to produce EUV radiation and collecting and directing the EUV radiation produced from the two or more target droplet by an imaging mirror."

The patent was...