ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,389,652, issued on Aug. 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of manufacturing a semiconductor device and a semiconductor device" was invented by Han-Yu Tsai (Hsinchu, Taiwan), Yi-Hsiu Liu (Taipei, Taiwan), You-Ting Lin (Miaoli County, Taiwan) and Chih-Chung Chang (Mingjian Township, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a semiconductor device includes forming a fin structure including a stacked layer of first semiconductor layers and second semiconductor layers disposed over a bottom fin structure and a hard mask layer over the stacked layer, forming an i...