US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 8 for "Method of measuring mask overlay using test patterns" (Taiwanese Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,271,116, issued on April 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Method of measuring mask overlay using test patterns" was invented by Tseng Chin Lo (Hsinchu, Taiwan), Bo-Sen Chang (Hsinchu, Taiwan), Yueh-Yi Chen (Hsinchu, Taiwan), Chih-Ting Sun (Hsinchu, Taiwan), Ying-Jung Chen (Hsinchu, Taiwan), Kung-Cheng Lin (Hsinchu, Taiwan) and Meng Lin Chang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Integrated circuits and methods for overlap measure are provided. In an embodiment, an integrated circuit includes a plurality of functional cells including at least one gap disposed adjacent to at least...