US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 8 for "Method of manufacturing integrated circuit" (Taiwanese Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,271,107, issued on April 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of manufacturing integrated circuit" was invented by Hsu-Ting Huang (Hsinchu, Taiwan), Shih-Hsiang Lo (Hsinchu, Taiwan) and Ru-Gun Liu (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for mask data synthesis and mask making includes calibrating an optical proximity correction (OPC) model by adjusting a plurality of parameters including a first parameter and a second parameter, wherein the first parameter indicates a long-range effect caused by an electron-beam lithography tool for making a mask used to manufacture...