US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 29 for "Method of manufacturing semiconductor devices using a photomask" (Taiwanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,581, issued on April 29, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of manufacturing semiconductor devices using a photomask" was invented by Chung-Hao Chang (Hsinchu, Taiwan), Ming-Wei Chen (Hsinchu, Taiwan), Ai-Jay Ma (Taoyuan County, Taiwan) and Ching-Yueh Chen (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of manufacturing a semiconductor device, in an EUV scanner, an EUV lithography operation using an EUV mask is performed on a photo resist layer formed over a semiconductor substrate. After the EUV lithography operation, the EUV mask is unloaded from a mask stage...