US Patent Issued to Taiwan Semiconductor Manufacturing on April 29 for "Lithography system and methods" (Taiwanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,572, issued on April 29, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Lithography system and methods" was invented by Cheng Hung Tsai (Hsinchu, Taiwan), Sheng-Kang Yu (Hsinchu, Taiwan), Shang-Chieh Chien (Hsinchu, Taiwan), Heng-Hsin Liu (Hsinchu, Taiwan) and Li-Jui Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes: depositing a mask layer over a substrate; directing first radiation reflected from a central collector section of a sectional collector of a lithography system toward the mask layer according to a pattern; directing second radiation reflected from a peripheral collecto...