US Patent Issued to Taiwan Semiconductor Manufacturing on April 22 for "Reflectors applied to photonics platforms" (American, Taiwanese Inventors)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,282,184, issued on April 22, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Reflectors applied to photonics platforms" was invented by Tai-Chun Huang (New Taipei, Taiwan) and Stefan Rusu (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming an optical device is provided that can include forming a backside reflector layer, and forming a cladding layer on the backside reflector layer. The method can further include forming a grating layer on the cladding layer, and forming a receiving reflector layer on the cladding layer. The receiving reflector layer can include an opening for receiving opt...