US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 22 for "Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask" (Taiwanese Inventors)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,282,260, issued on April 22, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask" was invented by Yu-Hsin Hsu (Taichung, Taiwan), Hao-Ming Chang (Pingtung, Taiwan), Shao-Chi Wei (Hsinchu, Taiwan), Sheng-Chang Hsu (New Taipei, Taiwan) and Cheng-Ming Lin (Yunlin County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for cleaning is provided. The method includes: removing a pellicle frame from a top surface of a photomask by debonding an adhesive between the photomask and the pellicle frame, wherein a first port...