US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 22 for "Gas dispenser and deposition apparatus using the same" (Taiwanese Inventors)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,281,385, issued on April 22, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Gas dispenser and deposition apparatus using the same" was invented by Chung-Liang Cheng (Changhua, Taiwan), Wei Zhang (Chupei, Taiwan), Ching-Chia Wu (Taichung, Taiwan), Wei-Jen Chen (Taichung, Taiwan) and Yen-Yu Chen (Taichung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas dispenser utilized in a deposition apparatus is provided. The gas dispenser includes a showerhead comprising a plurality of holes, and a mask layer formed on a surface of the showerhead, wherein the holes penetrate through the mask layer. A deposition apparatus u...