ALEXANDRIA, Va., June 6 -- United States Patent no. 12,283,526, issued on April 22, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Edge fin trim process" was invented by Jen-Chun Chou (Hsinchu, Taiwan), Ren-Yu Chang (Hsinchu, Taiwan), Che-Cheng Chang (New Taipei, Taiwan) and Chen-Hsiang Lu (Hsin-Chu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor structures and methods are provided. In one embodiment, a method of the present disclosure includes forming a plurality of semiconductor fins over a substrate, after the forming of the plurality of semiconductor fins, removing an outer semiconductor fin of the plurality of semiconductor fins, and forming a ga...