ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,235, issued on April 15, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor device with isolation structure" was invented by Shi-Ning Ju (Hsin Chiu, Taiwan), Kuo-Cheng Chiang (Zhubei, Taiwan), Kuan-Lun Cheng (Tainan, Taiwan) and Chih-Hao Wang (Baoshan Township, Hsinchu County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device structure is provided. The semiconductor device structure includes multiple semiconductor nanostructures and a gate stack wrapped around the semiconductor nanostructures. The semiconductor device structure also includes a first epitaxial structure and a se...