US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING, TSMC NANJING on June 17 for "Combined function IC cell layout method and system" (Taiwanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,919, issued on June 17, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and TSMC NANJING COMPANY Ltd. (Naning, China).

"Combined function IC cell layout method and system" was invented by Ying Huang (Hsinchu, Taiwan), Changlin Huang (Hsinchu, Taiwan), Jing Ding (Hsinchu, Taiwan) and Qingchao Meng (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of generating an integrated circuit (IC) layout diagram includes arranging a first portion of first through fourth pluralities of active regions and a plurality of gate regions of a cell as a functional circuit in a first portion of the cell, arranging...