US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING, TSMC CHINA on April 8 for "Integrated circuit with constrained metal line arrangement, method of using, and system for using" (Taiwanese Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,271,678, issued on April 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and TSMC CHINA COMPANY Ltd. (Shanghai).

"Integrated circuit with constrained metal line arrangement, method of using, and system for using" was invented by XinYong Wang (Hsinchu, Taiwan), Qiquan Wang (Hsinchu, Taiwan), Li-Chun Tien (Hsinchu, Taiwan) and Yuan Ma (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of making an integrated circuit includes dividing, in a first layer of an integrated circuit layout, a first arrangement of metal lines into a first set of metal lines and a second set of metal lines, wherein the fir...