US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING, NATIONAL CHENG KUNG UNIVERSITY on Nov. 4 for "Semiconductor structure" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,464,790, issued on Nov. 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. and NATIONAL CHENG KUNG UNIVERSITY.

"Semiconductor structure" was invented by Te-Ming Kung (Taichung, Taiwan), Ying-Lang Wang (Tai-Chung, Taiwan), Kei-Wei Chen (Tainan, Taiwan), Wen-Hsi Lee (Kaohsiung, Taiwan) and Shu Wei Chang (Kaohsiung, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a substrate, a nanowire disposed over the substrate, a metal gate electrode layer and a gate dielectric layer. A dielectric layer is formed on the substrate. The nanowire has a first portion and a second portion. The nanowire has a first port...