ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,057, issued on March 25, was assigned to Tahoe Research Ltd. (Dublin).
"Textile patterning for subtractively-patterned self-aligned interconnects, plugs, and vias" was invented by Kevin Lin (Beaverton, Ore.), Robert Lindsey Bristol (Portland, Ore.) and Alan M. Myers (Beaverton, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the invention include methods of forming a textile patterned hardmask. In an embodiment, a first hardmask and a second hardmask are formed over a top surface of an interconnect layer in an alternating pattern. A sacrificial cross-grating may then be formed over the first and second hardmasks. In an embodiment...