US Patent Issued to SYSMEX on May 20 for "Method for controlling affinity of antibody for antigen, antibody whose affinity for antigen has been altered, and its production method" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,304,971, issued on May 20, was assigned to SYSMEX Corp. (Kobe, Japan).

"Method for controlling affinity of antibody for antigen, antibody whose affinity for antigen has been altered, and its production method" was invented by Shingo Maeta (Kobe, Japan) and Atsushi Fukunaga (Kobe, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for controlling affinity of an antibody for an antigen, comprising substituting at least 3 amino acid residues of framework region 3 (FR3) defined by the Chothia method with charged amino acid residues, in an antibody whose electrical characteristic of complementarity determining region (CDR) based on th...