ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,228,491, issued on Feb. 18, was assigned to SYSMEX Corp. (Hyogo, Japan).
"Measurement apparatus and quality control method" was invented by Hiroo Tatsutani (Kobe, Japan), Motoi Kinishi (Kobe, Japan), Tomohiro Tsuji (Kobe, Japan), Yasuaki Tsuruoka (Kobe, Japan) and Satoshi Yoneda (Kobe, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a measurement apparatus that includes: a measurement unit configured to measure a control sample for quality control; a display unit; and a processing unit configured to cause the display unit to display an input screen for setting an evaluation criterion used in the quality control, and, in the measurement...