US Patent Issued to SYSMEX on Aug. 26 for "Ion sensor, ion sensor manufacturing method, and ion measurement method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,145, issued on Aug. 26, was assigned to SYSMEX Corp. (Kobe, Japan).

"Ion sensor, ion sensor manufacturing method, and ion measurement method" was invented by Junko Kojima (Kobe, Japan), Kenichi Uchiyama (Kobe, Japan) and Sayaka Hongo (Kobe, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion sensor is disclosed that includes an ion selective electrode including a first internal solid layer including a first insertion material, and a first ion conductive ceramic, an ion selective membrane provided on the first internal solid layer, a reference electrode including a second internal solid layer including a second insertion material, and a secon...