US Patent Issued to Synopsys on Nov. 25 for "Mask corner rounding effects in three-dimensional mask simulations using feature images" (California Inventor)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,213, issued on Nov. 25, was assigned to Synopsys Inc. (Sunnyvale, Calif.).

"Mask corner rounding effects in three-dimensional mask simulations using feature images" was invented by Peng Liu (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A layout geometry of a lithographic mask is received. The layout geometry includes at least one shape having one or more rounded corners. The layout geometry is partitioned into a plurality of feature images, for example as selected from a library. The feature images include at least one mask corner rounding (MCR)-corrected feature image that accounts for the rounded corners of the shape. The featu...