US Patent Issued to Synopsys on Nov. 18 for "Mask synthesis integrating mask fabrication effects and wafer lithography effects" (California Inventor)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,634, issued on Nov. 18, was assigned to Synopsys Inc. (Sunnyvale, Calif.).

"Mask synthesis integrating mask fabrication effects and wafer lithography effects" was invented by Peng Liu (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In some aspects, an integrated model accounts for effects from both the mask fabrication process and the wafer lithography process. The aerial image incident on the wafer, the pattern printed on the wafer, and/or measures of the foregoing are estimated using an integrated three-dimensional mask (M3D) model, as follows. The shapes in the mask fabrication description are partitioned into feature images. Ea...