US Patent Issued to Synopsys on March 4 for "Enforcing mask synthesis consistency across random areas of integrated circuit chips" (California, Texas Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,183, issued on March 4, was assigned to Synopsys Inc. (Sunnyvale, Calif.).

"Enforcing mask synthesis consistency across random areas of integrated circuit chips" was invented by Thomas Christopher Cecil (Menlo Park, Calif.) and Kevin Hooker (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system generates a mask for a circuit design while enforcing symmetry and consistency across random areas of the mask. The system builds a mask solutions database mapping circuit patterns to mask patterns. The system uses the mask solutions database to replace circuit patterns of the circuit design with mask patterns. The system identifies properties...