US Patent Issued to Synopsys on March 11 for "Large scale computational lithography using machine learning models" (German, American Inventors)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,249,115, issued on March 11, was assigned to Synopsys Inc. (Sunnyvale, Calif.).

"Large scale computational lithography using machine learning models" was invented by Dereje Shewaseged Woldeamanual (Munich), Thomas Heribert Mulders (Erding, Germany), Jiuzhou Tang (Munich), Rainer Zimmermann (Sauerlach, Germany), Robert Marshall Lugg (Portland, Ore.), Hans-Jurgen Stock (Dachau, Germany) and Georg Albert Viehover (Hohenkirchen-Siegertsbrunn, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A computational lithography process uses machine learning models. An aerial image produced by a lithographic mask is first calculated using a two-dimensional mode...