US Patent Issued to Synopsys on Jan. 27 for "Representing lithographic layouts using parametric curves" (Taiwanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,741, issued on Jan. 27, was assigned to Synopsys Inc. (Sunnyvale, Calif.).

"Representing lithographic layouts using parametric curves" was invented by Yung-Yu Chen (Hsinchu, Taiwan) and Wen-Li Cheng (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A layout is used in a computational lithography process. For example, the layout may be the layout of the lithographic mask or the layout of the desired resist shape. The layout is made up of multiple disjoint shapes. At least some of the disjoint shapes are represented by parametric curve representations, rather than polygons or other rectilinear representations. The parametric curve repres...