ALEXANDRIA, Va., June 16 -- United States Patent no. 12,308,246, issued on May 20, was assigned to SWAYSURE TECHNOLOGY Co. LTD. (Shenzhen, China).
"Method for manufacturing semiconductor device" was invented by Mao-Hua Su (Shenzhen, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a semiconductor device includes: forming, on a substrate, a pair of film layers stacked in a vertical direction to form a stack structure, the pair of film layers includes a first material layer and a second material layer sequentially stacked in the vertical direction, the first material layer is an isolation material layer, and the second material layer is a sacrificial material layer or a conductiv...