US Patent Issued to SUZHOU HAN HUA SEMICONDUCTOR on Nov. 18 for "Microlens arrays and method for fabricating the same" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,472,710, issued on Nov. 18, was assigned to SUZHOU HAN HUA SEMICONDUCTOR Co. LTD. (Jiangsu, China).

"Microlens arrays and method for fabricating the same" was invented by Qian Fan (Suzhou, China) and Xianfeng Ni (Suzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for fabricating a microlens array includes: step S1, providing a first substrate, and forming a patterned mask layer on the first substrate; step S2, etching the first substrate to form spaced grooves; step S3, removing the patterned mask layer; step S4, attaching a photoresist layer to the upper surface of the first substrate; step S5, softening the photoresist layer so that...