US Patent Issued to SUZHOU EVERBRIGHT PHOTONICS, EVERBRIGHT INSTITUTE OF SEMICONDUCTOR PHOTONICS on Nov. 25 for "Semiconductor structure and method for manufacturing same" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,483,005, issued on Nov. 25, was assigned to SUZHOU EVERBRIGHT PHOTONICS Co. LTD. (China) and EVERBRIGHT INSTITUTE OF SEMICONDUCTOR PHOTONICS Co. LTD. (China).

"Semiconductor structure and method for manufacturing same" was invented by Jun Wang (Suzhou, China), Shaoyang Tan (Suzhou, China), Li Zhou (Suzhou, China), Bangguo Wang (Suzhou, China), Yintao Guo (Suzhou, China), Xinsheng Liao (Suzhou, China) and Quanling Li (Suzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure and a method for manufacturing a semiconductor structure are provided. The semiconductor structure includes: a semiconductor substrate layer; an N-type w...