US Patent Issued to SUNALLOMER, RESONAC on Sept. 16 for "Polypropylene-based resin composition containing ultrahigh molecular weight propylene (co)polymer" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,415,914, issued on Sept. 16, was assigned to SUNALLOMER LTD. (Tokyo) and RESONAC Corp. (Tokyo).

"Polypropylene-based resin composition containing ultrahigh molecular weight propylene (co)polymer" was invented by Yutaka Yokoyama (Tokyo), Hiroshi Kajioka (Kanagawa, Japan), Akihiro Kamimura (Kanagawa, Japan) and Shuji Akinaga (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polypropylene-based resin composition contains: a component (A1) being a propylene homopolymer or a copolymer of propylene and a 30 wt % or less Alpha-olefin having 2 or 4 to 8 carbon atoms, having a intrinsic viscosity of more than 20 dl/g, as measured in a tetralin s...