US Patent Issued to SUMITOMO METAL MINING on May 13 for "Optical film, sputtering target, and method of producing optical film" (Japanese Inventor)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,528, issued on May 13, was assigned to SUMITOMO METAL MINING Co. LTD. (Tokyo).

"Optical film, sputtering target, and method of producing optical film" was invented by Hideharu Okami (Niihama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an optical film (composite tungsten oxide film containing cesium, tungsten, and oxygen), a sputtering target, and a method of producing an optical film by which film formation conditions can be easily obtained. An optical film of the present invention has transmissivity in a visible wavelength band, has absorbance in a near-infrared wavelength band, and has radio wave transparency, characterized i...