US Patent Issued to SUMITOMO HEAVY INDUSTRIES on Sept. 23 for "Process monitor and process monitoring method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,469, issued on Sept. 23, was assigned to SUMITOMO HEAVY INDUSTRIES LTD. (Tokyo).

"Process monitor and process monitoring method" was invented by Teppei Tanaka (Yokosuka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process monitor includes a photodetector that separately measures intensities of radiant light from a semiconductor member being annealed, in a plurality of wavelength ranges that are different from each other, and a processing device that obtains a physical quantity related to the semiconductor member that changes due to annealing, based on the intensities in the plurality of wavelength ranges measured by the photodetector." ...