US Patent Issued to SUMITOMO ELECTRIC INDUSTRIES on July 8 for "Method of manufacturing photodetection device" (Japanese Inventor)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,356,734, issued on July 8, was assigned to SUMITOMO ELECTRIC INDUSTRIES LTD. (Osaka, Japan).

"Method of manufacturing photodetection device" was invented by Ren Kimura (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a photodetection device includes preparing a first substrate having a first electrode; forming, on the first substrate, a photoresist film having an opening through which the first electrode is exposed; forming, through the opening, a metallic film containing a first metal on the first electrode; and removing, after the forming of the metallic film, the photoresist film. The forming of the metallic film ...