ALEXANDRIA, Va., June 25 -- United States Patent no. 12,338,357, issued on June 24, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo).
"Photosensitive composition" was invented by Tomohiro Fukuura (Osaka, Japan), Yoshihiro Harada (Osaka, Japan), Yoshifumi Komatsu (Osaka, Japan) and Masayoshi Tokuda (Osaka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The photosensitive composition according to the present invention is a photosensitive composition including a semiconductor particle (A), a photopolymerizable compound (C) and a photopolymerization initiator (D), in which the photosensitive composition satisfies any one or more of the following (a) to (c): (a) the photosensitive composition further incl...