US Patent Issued to Sumitomo Chemical on July 15 for "Resin, resist composition and method for producing resist pattern, and compound" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,450, issued on July 15, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo).

"Resin, resist composition and method for producing resist pattern, and compound" was invented by Yuji Kita (Osaka, Japan) and Koji Ichikawa (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a resin comprising a structural unit represented by formula (I), and a structural unit represented by formula (a1-1) and/or a structural unit represented by formula (a1-2), and a resist composition including this resin:"

The patent was filed on Dec. 15, 2020, under Application No. 17/122,082.

*For further information, including images, charts and tables, please...