US Patent Issued to Sumitomo Chemical on Jan. 20 for "Salt, acid generator, resin, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,957, issued on Jan. 20, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo).

"Salt, acid generator, resin, resist composition and method for producing resist pattern" was invented by Masahiko Shimada (Osaka, Japan) and Koji Ichikawa (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A salt represented by formula (I), a resin comprising a structural unit derived from the salt represented by formula (I), a resit composition comprising the salt represented by formula (I) or a resin comprising a structural unit derived from the salt represented by formula (I)."

The patent was filed on Oct. 31, 2022, under Application No. 17/977,122.

*For furt...