ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,789, issued on July 29, was assigned to SUMCO Corp. (Tokyo).
"Vapor deposition device and carrier used in same" was invented by Naoyuki Wada (Tokyo) and Yu Minamide (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A carrier is formed in ring shape having a bottom surface mounted on an upper surface of a susceptor, an upper surface that contacts and supports an outer edge of a back surface of the wafer, an outer peripheral side wall surface and an inner peripheral side wall surface, and a gas vent hole is provided to penetrate between a space partitioned by the wafer, the carrier and the susceptor and a back surface of the susceptor."
The paten...