US Patent Issued to SUMCO on Dec. 16 for "Wafer storage container cleaning apparatus, and wafer storage container cleaning method" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,097, issued on Dec. 16, was assigned to SUMCO Corp. (Tokyo).

"Wafer storage container cleaning apparatus, and wafer storage container cleaning method" was invented by Fumitoshi Iwasaki (Tokyo) and Katsuro Wakasugi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer container cleaner includes a cleaning bath capable of accommodating a housing jig that houses a wafer container including a container body and a cover, liquid-supply nozzles for supplying cleaning liquid or the like into the cleaning bath, and a liquid-discharge nozzle for discharging to-be-discharged fluid out of the cleaning bath. The container body has a depth wall at a side ...