ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,388, issued on Feb. 3, was assigned to STMicroelectronics (Crolles 2) SAS (Crolles, France).

"Photosensitive sensor and corresponding manufacturing method" was invented by Francois Roy (Seyssin, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photosensitive sensor includes a pixel formed by a photosensitive region in a first semiconductor material, a read region in a second semiconductor material, and a transfer gate facing the parts of the first semiconductor material and the second semiconductor material located between the photosensitive region and the read region. The first semiconductor material and the second semiconductor material have...